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2019.05.20

Announcement

Information Regarding Highly Heat-Resistant and Transparent Stereolithography Material SIS-200 Published in Wohlers Report 2019

 Information Regarding Highly Heat-Resistant and Transparent Stereolithography Material SIS-200 Published in Wohlers Report 2019

Information on SIS-200, a stereolithography material with high heat resistance (up to 220℃) and high transparency originally developed by SOLIZE, has been published in Wohlers Report 2019, a world-renowned report in the 3D printing and additive manufacturing industries, published by Wohlers Associates, Inc.

Click here for Wohlers Report 2019

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